This erratum is to correct an error in the simulations detailed in our paper [ J. Opt. Soc. Am A 26, 1687 (2009) ].
© 2009 Optical Society of America
Original Manuscript: November 17, 2009
Manuscript Accepted: November 17, 2009
Published: December 9, 2009
Xu Ma and Gonzalo R. Arce, "Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratum," J. Opt. Soc. Am. A 27, 82-84 (2010)
J. Opt. Soc. Am. A
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