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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Editor: Franco Gori
  • Vol. 28, Iss. 2 — Feb. 1, 2011
  • pp: 263–271

Fitting-determined formulation of effective medium approximation for 3D trench structures in model-based infrared reflectrometry

Chuanwei Zhang, Shiyuan Liu, Tielin Shi, and Zirong Tang  »View Author Affiliations

JOSA A, Vol. 28, Issue 2, pp. 263-271 (2011)

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The success of the model-based infrared reflectrometry (MBIR) technique relies heavily on accurate modeling and fast calculation of the infrared metrology process, which continues to be a challenge, especially for three- dimensional (3D) trench structures. In this paper, we present a simplified formulation for effective medium approximation (EMA), determined by a fitting-based method for the modeling of 3D trench structures. Intensive investigations have been performed with an emphasis on the generality of the fitting-determined (FD)-EMA formulation in terms of trench depth, trench pitch, and incidence angle so that its application is not limited to a particular configuration. Simulations conducted on a taper trench structure have further verified the proposed FD-EMA and demonstrated that the MBIR metrology with the FD-EMA-based model achieves an accuracy one order higher than that of the conventional zeroth-order EMA-based model.

© 2011 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(300.6340) Spectroscopy : Spectroscopy, infrared
(050.2065) Diffraction and gratings : Effective medium theory
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: September 7, 2010
Revised Manuscript: November 26, 2010
Manuscript Accepted: December 14, 2010
Published: February 1, 2011

Chuanwei Zhang, Shiyuan Liu, Tielin Shi, and Zirong Tang, "Fitting-determined formulation of effective medium approximation for 3D trench structures in model-based infrared reflectrometry," J. Opt. Soc. Am. A 28, 263-271 (2011)

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