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Left-handed metamaterial coatings for subwavelength-resolution imaging |
JOSA A, Vol. 29, Issue 9, pp. 1992-1998 (2012)
http://dx.doi.org/10.1364/JOSAA.29.001992
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Abstract
We report on a procedure to improve the resolution of far-field imaging by using a neighboring high-index medium that is coated with a left-handed metamaterial. The resulting plot can also exhibit an enhanced transmission by considering proper conditions to retract backscattering. Based on negative refraction, geometrical aberrations are considered in detail since they may cause a great impact in this sort of diffraction-unlimited imaging by reducing its resolution power. We employ a standard aberration analysis to refine the asymmetric configuration of metamaterial superlenses. We demonstrate that low-order centrosymmetric aberrations can be fully corrected for a given object plane. For subwavelength-resolution imaging, however, high-order aberrations become of relevance, which may be balanced with defocus. Not only the point spread function but also numerical simulations based on the finite-element method support our theoretical analysis, and subwavelength resolution is verified in the image plane.
© 2012 Optical Society of America
OCIS Codes
(110.2990) Imaging systems : Image formation theory
(220.1000) Optical design and fabrication : Aberration compensation
(160.3918) Materials : Metamaterials
ToC Category:
Materials
History
Original Manuscript: May 7, 2012
Revised Manuscript: July 10, 2012
Manuscript Accepted: July 28, 2012
Published: August 30, 2012
Citation
Carlos J. Zapata-Rodríguez, David Pastor, Luis E. Martínez, and Juan J. Miret, "Left-handed metamaterial coatings for subwavelength-resolution imaging," J. Opt. Soc. Am. A 29, 1992-1998 (2012)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-29-9-1992
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