A description is given of a modeling technique that is used to explore three-dimensional image distributions formed by high numerical aperture (NA > 0.6) lenses in homogeneous, isotropic, linear, and source-free thin films. The approach is based on a plane-wave decomposition in the exit pupil. Factors that are due to polarization, aberration, object transmittance, propagation, and phase terms are associated with each plane-wave component. These are combined with a modified thin-film matrix technique in a derivation of the total field amplitude at each point in the film by a coherent vector sum over all plane waves. One then calculates the image distribution by squaring the electric-field amplitude. The model is used to show how asymmetries present in the polarized image change with the influence of a thin film. Extensions of the model to magneto-optic thin films are discussed.
© 1996 Optical Society of America
Original Manuscript: May 23, 1994
Revised Manuscript: July 28, 1995
Manuscript Accepted: July 26, 1995
Published: January 1, 1996
Donis G. Flagello, Tom Milster, and Alan E. Rosenbluth, "Theory of high-NA imaging in homogeneous thin films," J. Opt. Soc. Am. A 13, 53-64 (1996)