During kinetic ellipsometric investigations in light-intensive plasma discharges, an offset error generally must be taken into consideration. The influence of an offset error on the ellipsometric angles Ψ and Δ is demonstrated, and possibilities for overcoming this problem are presented. Examples are given for deposition of titanium by a hollow cathode arc evaporation device and by a dc magnetron sputter source. Ellipsometric measurements were done with two ellipsometers: a monochromatic ellipsometer with a rotating analyzer and an ellipsometer with a photoelastic modulator.
© 1997 Optical Society of America
[Optical Society of America ]
H. Steffen, "Offset errors during kinetic ellipsometric measurements in light- intensive plasma discharges," J. Opt. Soc. Am. A 14, 1541-1544 (1997)