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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Vol. 16, Iss. 3 — Mar. 1, 1999
  • pp: 591–595

Analysis of high-confinement SiGe/Si waveguides for silicon-based optoelectronics

S. P. Pogossian, L. Vescan, and A. Vonsovici  »View Author Affiliations


JOSA A, Vol. 16, Issue 3, pp. 591-595 (1999)
http://dx.doi.org/10.1364/JOSAA.16.000591


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Abstract

We analyze theoretically the feasibility of what we believe to be a novel two-dimensional SiGe/Si strained-layer waveguide. The new geometry can be grown by selective epitaxy and has loosened cutoff and critical-thickness restrictions. This geometry could be applied for waveguide-active devices such as LED’s, photodetectors, and modulators. Owing to the high cross section of the guided mode, these devices could be easily interfaced in practice with optical fibers.

© 1999 Optical Society of America

OCIS Codes
(160.6000) Materials : Semiconductor materials
(230.7380) Optical devices : Waveguides, channeled
(350.5500) Other areas of optics : Propagation

History
Original Manuscript: July 13, 1998
Manuscript Accepted: October 28, 1998
Published: March 1, 1999

Citation
S. P. Pogossian, L. Vescan, and A. Vonsovici, "Analysis of high-confinement SiGe/Si waveguides for silicon-based optoelectronics," J. Opt. Soc. Am. A 16, 591-595 (1999)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-16-3-591


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