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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Vol. 16, Iss. 8 — Aug. 1, 1999
  • pp: 1909–1914

Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography

M. Erdélyi, Zs. Bor, W. L. Wilson, M. C. Smayling, and F. K. Tittel  »View Author Affiliations


JOSA A, Vol. 16, Issue 8, pp. 1909-1914 (1999)
http://dx.doi.org/10.1364/JOSAA.16.001909


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Abstract

A resolution enhancement technique for optical microlithography based on coherent multiple imaging was investigated with use of Prolith/2 (a commercial lithographic simulation tool). It was shown that a Fabry–Perot etalon placed between the mask and the projection lens of an optical stepper could be interpreted as an appropriate transmission-phase pupil-plane filter. While previous calculations were able to evaluate simple patterns (such as an on-axis contact hole), this new approach also allows the simulation of complex mask patterns. Evaluation of the point-spread function of the optical systems by means of coherent multiple imaging showed that an optimized filter is capable of increasing the resolution by 28% and the depth of focus by 150%.

© 1999 Optical Society of America

OCIS Codes
(050.2230) Diffraction and gratings : Fabry-Perot
(070.6110) Fourier optics and signal processing : Spatial filtering
(100.2980) Image processing : Image enhancement
(110.4190) Imaging systems : Multiple imaging
(110.4850) Imaging systems : Optical transfer functions
(110.5220) Imaging systems : Photolithography

History
Original Manuscript: October 19, 1998
Revised Manuscript: April 5, 1999
Manuscript Accepted: April 5, 1999
Published: August 1, 1999

Citation
M. Erdélyi, Zs. Bor, W. L. Wilson, M. C. Smayling, and F. K. Tittel, "Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography," J. Opt. Soc. Am. A 16, 1909-1914 (1999)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-16-8-1909

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