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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Vol. 16, Iss. 8 — Aug. 1, 1999
  • pp: 1909–1914

Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography

M. Erdélyi, Zs. Bor, W. L. Wilson, M. C. Smayling, and F. K. Tittel  »View Author Affiliations


JOSA A, Vol. 16, Issue 8, pp. 1909-1914 (1999)
http://dx.doi.org/10.1364/JOSAA.16.001909


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Abstract

A resolution enhancement technique for optical microlithography based on coherent multiple imaging was investigated with use of Prolith/2 (a commercial lithographic simulation tool). It was shown that a Fabry–Perot etalon placed between the mask and the projection lens of an optical stepper could be interpreted as an appropriate transmission-phase pupil-plane filter. While previous calculations were able to evaluate simple patterns (such as an on-axis contact hole), this new approach also allows the simulation of complex mask patterns. Evaluation of the point-spread function of the optical systems by means of coherent multiple imaging showed that an optimized filter is capable of increasing the resolution by 28% and the depth of focus by 150%.

© 1999 Optical Society of America

OCIS Codes
(050.2230) Diffraction and gratings : Fabry-Perot
(070.6110) Fourier optics and signal processing : Spatial filtering
(100.2980) Image processing : Image enhancement
(110.4190) Imaging systems : Multiple imaging
(110.4850) Imaging systems : Optical transfer functions
(110.5220) Imaging systems : Photolithography

History
Original Manuscript: October 19, 1998
Revised Manuscript: April 5, 1999
Manuscript Accepted: April 5, 1999
Published: August 1, 1999

Citation
M. Erdélyi, Zs. Bor, W. L. Wilson, M. C. Smayling, and F. K. Tittel, "Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography," J. Opt. Soc. Am. A 16, 1909-1914 (1999)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-16-8-1909


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References

  1. M. Erdélyi, Z. L. Horváth, G. Szabo, Zs. Bor, F. K. Tittel, J. R. Cavallaro, M. C. Smayling, “Generation of diffraction-free beams for application in optical microlithography,” J. Vac. Sci. Technol. B 15, 287–292 (1997). [CrossRef]
  2. Z. L. Horváth, M. Erdélyi, G. Szabo, Zs. Bor, F. K. Tittel, J. R. Cavallaro, “Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer,” J. Opt. Soc. Am. A 14, 3009–3013 (1997). [CrossRef]
  3. M. Erdélyi, A. Kroyen, K. Osvay, Z. Bor, W. L. Wilson, M. C. Smayling, F. K. Tittel, “Coherent multiple imaging by means of pupil plane filtering,” in Optical Microlitho graphy XII, L. van den Hove, ed., Proc. SPIE3679, 439 (1999).
  4. H. Fukuda, T. Terasawa, S. Okazaki, “Spatial filtering for depth of focus and resolution enhancement in optical lithography,” J. Vac. Sci. Technol. B 9, 3113–3116 (1991). [CrossRef]
  5. R. von Bünau, G. Owen, R. F. W. Pease, “Depth of focus enhancement in optical lithography,” J. Vac. Sci. Technol. B 10, 3047–3054 (1992). [CrossRef]
  6. T. Horiuchi, K. Harada, S. Matsuo, Y. Takeuchi, E. Tamechika, Y. Mimura, “Resolution enhancement by oblique illumination optical lithography using a transmittance-adjusted pupil filter,” Jpn. J. Appl. Phys. 34, 1698–1708 (1995). [CrossRef]
  7. M. Erdélyi, Zs. Bor, G. Szabo, F. K. Tittel, “Enhanced microlithography using coated objective and image duplication,” in Optical Microlithography XI, L. van den Hove, ed., Proc. SPIE3334, 579–589 (1998). [CrossRef]
  8. Chris A. Mack, Inside Prolith™; a Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Tex., 1997).

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