Numerical feasibility study of the fabrication of subwavelength structure by mask lithography
JOSA A, Vol. 18, Issue 5, pp. 1093-1100 (2001)
http://dx.doi.org/10.1364/JOSAA.18.001093
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Abstract
Electromagnetic diffraction of a light wave by a single aperture of subwavelength width and subsequent propagation in a lossy medium are numerically investigated. This diffraction problem simulates exposure of a resist with an amplitude mask. It is found that there is the possibility of fabricating a λ/2 structure on a resist of λ/4 thickness, where λ is the wavelength of the exposing light in vacuum, by conventional contact or by proximity lithography. It is also found that an air gap between a mask and a resist of up to λ/2 does not have a significant effect on resolution. This approach permits easy and cost-effective fabrication of subwavelength structures and leads to wide availability of diffractive optical elements in the nonscalar domain.
© 2001 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.1220) Diffraction and gratings : Apertures
(050.1380) Diffraction and gratings : Binary optics
(050.1970) Diffraction and gratings : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
Citation
Hiroyuki Ichikawa and Hisao Kikuta, "Numerical feasibility study of the fabrication of subwavelength structure by mask lithography," J. Opt. Soc. Am. A 18, 1093-1100 (2001)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-18-5-1093
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