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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Vol. 19, Iss. 2 — Feb. 1, 2002
  • pp: 385–390

New layer-by-layer multilayer design method

Juan I. Larruquert  »View Author Affiliations

JOSA A, Vol. 19, Issue 2, pp. 385-390 (2002)

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A new layer-by-layer multilayer design method is presented. The method is demonstrated mathematically and makes possible the optimization of the multilayer for the highest possible reflectance either at normal incidence or at nonnormal incidence for s- or p-polarized radiation. With the current method multilayers can be designed regardless of the number of different materials used. The optimum layer thickness is determined by means of functions suitable for implementation in a computer code. The new multilayer design method is fast and accurate.

© 2002 Optical Society of America

OCIS Codes
(120.5700) Instrumentation, measurement, and metrology : Reflection
(220.3740) Optical design and fabrication : Lithography
(230.4170) Optical devices : Multilayers
(260.7200) Physical optics : Ultraviolet, extreme
(260.7210) Physical optics : Ultraviolet, vacuum
(340.7470) X-ray optics : X-ray mirrors
(350.6090) Other areas of optics : Space optics

Original Manuscript: April 4, 2001
Revised Manuscript: June 18, 2001
Manuscript Accepted: June 18, 2001
Published: February 1, 2002

Juan I. Larruquert, "New layer-by-layer multilayer design method," J. Opt. Soc. Am. A 19, 385-390 (2002)

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