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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Vol. 21, Iss. 6 — Jun. 1, 2004
  • pp: 959–967

Image formation by use of the geometrical theory of diffraction

Andrew Khoh, Ganesh S. Samudra, Yihong Wu, Tom Milster, and Byoung-Il Choi  »View Author Affiliations

JOSA A, Vol. 21, Issue 6, pp. 959-967 (2004)

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A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins’s image model. The models are scalar models and apply to planar, perfectly conducting mask objects.

© 2004 Optical Society of America

OCIS Codes
(110.2990) Imaging systems : Image formation theory
(110.3960) Imaging systems : Microlithography

Original Manuscript: August 20, 2003
Revised Manuscript: January 13, 2004
Manuscript Accepted: January 13, 2004
Published: June 1, 2004

Andrew Khoh, Ganesh S. Samudra, Yihong Wu, Tom Milster, and Byoung-Il Choi, "Image formation by use of the geometrical theory of diffraction," J. Opt. Soc. Am. A 21, 959-967 (2004)

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