A deeper understanding of imaging behavior is needed with the widespread adoption of optical proximity correction in advanced lithography processes. To gain insight into the printing behavior of different mask pattern configurations, we derive edge-based and vertex-based image models by combining concepts contained in the geometrical theory of diffraction and Hopkins’s image model. The models are scalar models and apply to planar, perfectly conducting mask objects.
© 2004 Optical Society of America
Andrew Khoh, Ganesh S. Samudra, Yihong Wu, Tom Milster, and Byoung-Il Choi, "Image formation by use of the geometrical theory of diffraction," J. Opt. Soc. Am. A 21, 959-967 (2004)