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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Vol. 22, Iss. 2 — Feb. 1, 2005
  • pp: 342–345

Photon-sieve lithography

Rajesh Menon, Dario Gil, George Barbastathis, and Henry I. Smith  »View Author Affiliations


JOSA A, Vol. 22, Issue 2, pp. 342-345 (2005)
http://dx.doi.org/10.1364/JOSAA.22.000342


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Abstract

We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.

© 2005 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(050.5080) Diffraction and gratings : Phase shift
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4610) Optical design and fabrication : Optical fabrication

Citation
Rajesh Menon, Dario Gil, George Barbastathis, and Henry I. Smith, "Photon-sieve lithography," J. Opt. Soc. Am. A 22, 342-345 (2005)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-22-2-342


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References

  1. H. I. Smith, "A proposal for maskless zone-plate-array lithography," J. Vac. Sci. Technol. B 14, 4318-4322 (1996).
  2. D. Gil, R. Menon, and H. I. Smith, "Fabrication of high-numerical-aperture phase zone plates with a single lithography exposure and no etching," J. Vac. Sci. Technol. B 21, 2956-2960 (2003).
  3. R. Menon, A. Patel, E. E. Moon, and H. I. Smith, "An alpha-prototype system for zone-plate-array lithography," J. Vac. Sci. Technol. B (to be published).
  4. W. Jung, F. J. Castaño, C. A. Ross, R. Menon, A. Patel, E. E. Moon, M. K. Mondol, and H. I. Smith, "Elliptical ring magnetic arrays fabricated using zone-plate-array lithography," J. Vac. Sci. Technol. B (to be published).
  5. L. Kipp, M. Skibowksi, R. L. Johnson, R. Berndt, R. Adelung, and R. Seemann, "Sharper images by focusing soft x-rays with photon sieves," Nature (London) 414, 184-188 (2001).
  6. Q. Cao and J. Jahns, "Nonparaxial model for the focusing of high-numerical-aperture photon sieves," J. Opt. Soc. Am. A 20, 1005-1012 (2003).
  7. Q. Cao and J. Jahns, "Focusing analysis of the pinhole photon sieve: individual far-field model," J. Opt. Soc. Am. A 19, 2387-2393 (2002).
  8. G. J. Dolan and T. A. Fulton, "Canyon lithography," IEEE Electron Device Lett. 4, 178-180 (1983).

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