Abstract
We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.
© 2005 Optical Society of America
Full Article | PDF ArticleMore Like This
Matthew N. Julian, David G. MacDonnell, and Mool C. Gupta
Opt. Express 25(25) 31528-31538 (2017)
Vanessa R. M. Rodrigues, Jayashree A. Dharmadhikari, Aditya K. Dharmadhikari, Santhosh Chidangil, Deepak Mathur, and Hema Ramachandran
OSA Continuum 2(4) 1328-1341 (2019)
Zhifeng Chen, Chinhua Wang, Donglin Pu, Jin Hu, and Linsen Chen
Opt. Express 18(15) 16279-16288 (2010)