Photon-sieve lithography
JOSA A, Vol. 22, Issue 2, pp. 342-345 (2005)
http://dx.doi.org/10.1364/JOSAA.22.000342
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Abstract
We present the first lithography results that use high-numerical-aperture photon sieves as focusing elements in a scanning-optical-beam-lithography system [J. Vac. Sci. Technol. B 21, 2810 (2003)]. Photon sieves are novel optical elements that offer the advantages of higher resolution and improved image contrast compared with traditional diffractive optics such as zone plates [Nature 414, 184 (2001)]. We fabricated the highest-numerical-aperture photon sieves reported to date and experimentally verified their focusing characteristics. We propose two new designs of the photon sieve that have the potential to significantly increase focusing efficiency.
© 2005 Optical Society of America
OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(050.5080) Diffraction and gratings : Phase shift
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4610) Optical design and fabrication : Optical fabrication
Citation
Rajesh Menon, Dario Gil, George Barbastathis, and Henry I. Smith, "Photon-sieve lithography," J. Opt. Soc. Am. A 22, 342-345 (2005)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-22-2-342
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