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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Editor: Stephen A. Burns
  • Vol. 24, Iss. 2 — Feb. 1, 2007
  • pp: 326–338

Error analysis in inverse scatterometry. I. Modeling

Rayan M. Al-Assaad and Dale M. Byrne  »View Author Affiliations


JOSA A, Vol. 24, Issue 2, pp. 326-338 (2007)
http://dx.doi.org/10.1364/JOSAA.24.000326


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Abstract

Scatterometry is an optical technique that has been studied and tested in recent years in semiconductor fabrication metrology for critical dimensions. Previous work presented an iterative linearized method to retrieve surface-relief profile parameters from reflectance measurements upon diffraction. With the iterative linear solution model in this work, rigorous models are developed to represent the random and deterministic or offset errors in scatterometric measurements. The propagation of different types of error from the measurement data to the profile parameter estimates is then presented. The improvement in solution accuracies is then demonstrated with theoretical and experimental data by adjusting for the offset errors. In a companion paper (in process) an improved optimization method is presented to account for unknown offset errors in the measurements based on the offset error model.

© 2007 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.3930) Instrumentation, measurement, and metrology : Metrological instrumentation
(120.5700) Instrumentation, measurement, and metrology : Reflection

ToC Category:
Diffraction and Gratings

History
Original Manuscript: January 6, 2006
Manuscript Accepted: July 18, 2006

Citation
Rayan M. Al-Assaad and Dale M. Byrne, "Error analysis in inverse scatterometry. I. Modeling," J. Opt. Soc. Am. A 24, 326-338 (2007)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-24-2-326


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References

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