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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Vol. 25, Iss. 12 — Dec. 1, 2008
  • pp: 2960–2970

Binary mask optimization for inverse lithography with partially coherent illumination

Xu Ma and Gonzalo Arce  »View Author Affiliations


JOSA A, Vol. 25, Issue 12, pp. 2960-2970 (2008)
http://dx.doi.org/10.1364/JOSAA.25.002960


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Abstract

Recently, a set of generalized gradient-based optical proximity correction optimization methods have been developed to solve for the inverse lithography problem under coherent illumination. Most practical lithography systems, however, operate under partially coherent illumination. This paper focuses on developing gradient-based binary mask optimization methods that account for the inherent nonlinearities of partially coherent systems. Two nonlinear models are used in the optimization. The first relies on a Fourier representation that approximates the partially coherent system as a sum of coherent systems. The second model is based on an average coherent approximation that is computationally faster. To influence the solution patterns toward more desirable manufacturability properties, wavelet regularization is added to the optimization framework.

© 2008 Optical Society of America

OCIS Codes
(100.3190) Image processing : Inverse problems
(100.7410) Image processing : Wavelets
(110.4980) Imaging systems : Partial coherence in imaging
(220.3740) Optical design and fabrication : Lithography

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: June 30, 2008
Revised Manuscript: September 16, 2008
Manuscript Accepted: September 21, 2008
Published: November 11, 2008

Citation
Xu Ma and Gonzalo Arce, "Binary mask optimization for inverse lithography with partially coherent illumination," J. Opt. Soc. Am. A 25, 2960-2970 (2008)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-25-12-2960


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