Reflection photoelastic tomography for the detection of stress distribution in planar optical waveguides
JOSA A, Vol. 25, Issue 5, pp. 1130-1141 (2008)
http://dx.doi.org/10.1364/JOSAA.25.001130
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Abstract
A novel method for measuring local stress distributions and birefringence of films on substrates and planar optical waveguides, with submicrometric resolution, is presented. The technique relies on a reflective tomographic configuration, applied in conjunction with a polarimetric setup, which processes the stress-induced change of the state of polarization of a laser probe beam reflected at the waveguide–substrate (film–substrate) interface. By this means, theoretically foreseen stress behavior can be experimentally verified and spurious or induced local stress variations in integrated optics components can also be brought into evidence. The feasibility of the proposed method has been verified by reconstructing the two-dimensional axial stress distribution in the
© 2008 Optical Society of America
OCIS Codes
(110.6960) Imaging systems : Tomography
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(230.5590) Optical devices : Quantum-well, -wire and -dot devices
(230.7370) Optical devices : Waveguides
(130.2755) Integrated optics : Glass waveguides
(310.4925) Thin films : Other properties (stress, chemical, etc.)
ToC Category:
Optical Devices
History
Original Manuscript: December 7, 2007
Revised Manuscript: March 4, 2008
Manuscript Accepted: March 6, 2008
Published: April 24, 2008
Citation
Silvia Maria Pietralunga, Maddalena Ferrario, Alberto Licciardello, and Mario Martinelli, "Reflection photoelastic tomography for the detection of stress distribution in planar optical waveguides," J. Opt. Soc. Am. A 25, 1130-1141 (2008)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-25-5-1130
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