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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Editor: Stephen A. Burns
  • Vol. 26, Iss. 1 — Jan. 1, 2009
  • pp: 10–18

Error analysis and compensation method of focus detection in exposure apparatus

Yasuhiro Hidaka, Kiyoshi Uchikawa, and Daniel G. Smith  »View Author Affiliations

JOSA A, Vol. 26, Issue 1, pp. 10-18 (2009)

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An original approach to measurement accuracy of a typical focus sensor in conventional integrated circuit lithographic equipment is introduced. Causes of measurement error in the focus sensor are theoretically analyzed and found to be generated mainly from interactions between imperfections of the optical system and the actual surface of processed wafers. We derive mathematical formulations describing these errors, which are confirmed by the experimental results performed by using an optical setup composed of the focus sensor and samples on which the wafer surface condition is reproduced. Furthermore, several novel techniques that are intended to reduce those measurement errors are successfully demonstrated.

© 2008 Optical Society of America

OCIS Codes
(110.2970) Imaging systems : Image detection systems
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure
(240.0310) Optics at surfaces : Thin films
(240.6490) Optics at surfaces : Spectroscopy, surface

ToC Category:
Optics at Surfaces

Original Manuscript: June 24, 2008
Revised Manuscript: October 17, 2008
Manuscript Accepted: October 25, 2008
Published: December 3, 2008

Yasuhiro Hidaka, Kiyoshi Uchikawa, and Daniel G. Smith, "Error analysis and compensation method of focus detection in exposure apparatus," J. Opt. Soc. Am. A 26, 10-18 (2009)

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