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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Editor: Stephen A. Burns
  • Vol. 26, Iss. 8 — Aug. 1, 2009
  • pp: 1889–1895

Optimized circularly symmetric phase mask to extend the depth of focus

Feng Zhou, Ran Ye, Guangwei Li, Haitao Zhang, and Dongsheng Wang  »View Author Affiliations


JOSA A, Vol. 26, Issue 8, pp. 1889-1895 (2009)
http://dx.doi.org/10.1364/JOSAA.26.001889


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Abstract

We propose a novel design method for a circularly symmetric phase mask to extend the depth of focus. Using the free-form rational function as the solution space, we optimize the profile of the phase mask by analysis of the axial intensity distribution, which can be calculated efficiently by employing the fast Fourier transform algorithm. Numerical comparisons prove the resulting rational phase mask’s superiority to the existing quartic phase mask in intensity distribution and imaging performance.

© 2009 Optical Society of America

OCIS Codes
(070.0070) Fourier optics and signal processing : Fourier optics and signal processing
(100.5090) Image processing : Phase-only filters
(110.0110) Imaging systems : Imaging systems

ToC Category:
Fourier Optics and Signal Processing

History
Original Manuscript: January 9, 2009
Revised Manuscript: June 1, 2009
Manuscript Accepted: June 16, 2009
Published: July 30, 2009

Virtual Issues
August 12, 2009 Spotlight on Optics

Citation
Feng Zhou, Ran Ye, Guangwei Li, Haitao Zhang, and Dongsheng Wang, "Optimized circularly symmetric phase mask to extend the depth of focus," J. Opt. Soc. Am. A 26, 1889-1895 (2009)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-26-8-1889


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