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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Editor: Franco Gori
  • Vol. 27, Iss. 1 — Jan. 1, 2010
  • pp: 82–84

Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratum

Xu Ma and Gonzalo R. Arce  »View Author Affiliations


JOSA A, Vol. 27, Issue 1, pp. 82-84 (2010)
http://dx.doi.org/10.1364/JOSAA.27.000082


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Abstract

This erratum is to correct an error in the simulations detailed in our paper [ J. Opt. Soc. Am A 26, 1687 (2009) ].

© 2009 Optical Society of America

OCIS Codes
(100.3190) Image processing : Inverse problems
(110.1650) Imaging systems : Coherence imaging
(220.3740) Optical design and fabrication : Lithography

History
Original Manuscript: November 17, 2009
Manuscript Accepted: November 17, 2009
Published: December 9, 2009

Citation
Xu Ma and Gonzalo R. Arce, "Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratum," J. Opt. Soc. Am. A 27, 82-84 (2010)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-27-1-82

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