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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Editor: Franco Gori
  • Vol. 27, Iss. 5 — May. 1, 2010
  • pp: 973–976

Nanolithography in the quasi-far field based on the destructive interference effect of surface plasmon polaritons

Xia Wan, Qingkang Wang, and Haihua Tao  »View Author Affiliations

JOSA A, Vol. 27, Issue 5, pp. 973-976 (2010)

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On the principle of phase-shift mask, the metal segment of a sub-wavelength Ag grating on a quartz substrate is used as a phase-shifting layer in this photolithography method. When the radiation modes of the surface plasmon polaritons (SPPs) excited on the Ag surface have optical phase opposite to that of the waves emitting from the slits, destructive interference occurs and the diffraction limit can be broken through. The SPPs excited on the surface between Ag and water can be transformed into propagation modes in the photoresist. Therefore, nanolithography can be achieved in the quasi-far field with this method.

© 2010 Optical Society of America

OCIS Codes
(070.6760) Fourier optics and signal processing : Talbot and self-imaging effects
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(350.3950) Other areas of optics : Micro-optics
(350.4600) Other areas of optics : Optical engineering

ToC Category:
Optical Design and Fabrication

Original Manuscript: December 9, 2009
Revised Manuscript: March 2, 2010
Manuscript Accepted: March 2, 2010
Published: April 5, 2010

Xia Wan, Qingkang Wang, and Haihua Tao, "Nanolithography in the quasi-far field based on the destructive interference effect of surface plasmon polaritons," J. Opt. Soc. Am. A 27, 973-976 (2010)

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