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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Editor: Franco Gori
  • Vol. 28, Iss. 11 — Nov. 1, 2011
  • pp: 2218–2225

Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses

John E. Foulkes and Richard J. Blaikie  »View Author Affiliations

JOSA A, Vol. 28, Issue 11, pp. 2218-2225 (2011)

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The ability to improve the transmission and intensity profiles in absorbance-modulation optical lithography (AMOL) [ J. Opt. Soc. Am. A 23, 2290 (2006) and Phys. Rev. Lett. 98, 043905 (2007)] through the introduction of a plasmonic metal layer is investigated. In this part of the work, a plasmonic layer is placed between the absorbance-modulation layer and the photoresist layer. Transmission through this layer is possible due to the ability of thin plasmonic layers to act as near-field analogues of negative refraction materials. The superlens performance is best with a thin layer of 10 20 nm , although this causes a full width at half-maximum increase of 50 % . The introduction of the plasmonic layers allows dichroic filtering of the two wavelengths, with a difference of a factor of 10 in the transmitted intensity ratio, reducing undesirable exposure of the resist. The presented work demonstrates that a plasmonic layer can be interfaced with an AMOL system, but that further optimization and material development are needed to allow substantial performance improvements.

© 2011 Optical Society of America

OCIS Codes
(110.5220) Imaging systems : Photolithography
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Imaging Systems

Original Manuscript: August 5, 2011
Manuscript Accepted: August 26, 2011
Published: October 5, 2011

John E. Foulkes and Richard J. Blaikie, "Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses," J. Opt. Soc. Am. A 28, 2218-2225 (2011)

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