We develop and solve the equations of multiple-wavelength ellipsometry for thin uniaxial nonabsorbing films. We show that the values of the thickness and the real refractive indices (parallel and perpendicular to the optical axis) of the thin film can be obtained by three measurements, at three different wavelengths, of the phase difference (between the filmed and bare substrate phase changes caused by reflection), provided that the refractive indices of both the incident medium and the substrate are significantly dispersive. We also show, in the case of a dispersive thin film, how to determine the indices of refraction in terms of wavelength up to any desired accuracy by making the appropriate number of measurements of the phase difference at different wavelengths.
© 1986 Optical Society of America
Original Manuscript: October 3, 1985
Manuscript Accepted: May 16, 1986
Published: November 1, 1986
Adel F. Antippa, Roger M. Leblanc, and Daniel Ducharme, "Multiple-wavelength ellipsometry in thin uniaxial nonabsorbing films," J. Opt. Soc. Am. A 3, 1794-1802 (1986)