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Journal of the Optical Society of America A

Journal of the Optical Society of America A

| OPTICS, IMAGE SCIENCE, AND VISION

  • Editor: Franco Gori
  • Vol. 30, Iss. 1 — Jan. 1, 2013
  • pp: 112–123

Pixelated source and mask optimization for immersion lithography

Xu Ma, Chunying Han, Yanqiu Li, Lisong Dong, and Gonzalo R. Arce  »View Author Affiliations


JOSA A, Vol. 30, Issue 1, pp. 112-123 (2013)
http://dx.doi.org/10.1364/JOSAA.30.000112


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Abstract

Immersion lithography systems with hyper-numerical aperture (hyper-NA) (NA>1) have become indispensable in nanolithography for technology nodes of 45 nm and beyond. Source and mask optimization (SMO) has emerged as a key technique used to further improve the imaging performance of immersion lithography. Recently, a set of pixelated gradient-based SMO approaches were proposed under the scalar imaging models, which are inaccurate for hyper-NA settings. This paper focuses on developing pixelated gradient-based SMO algorithms based on a vector imaging model that is accurate for current immersion lithography. To achieve this goal, an integrative and analytic vector imaging model is first used to formulate the simultaneous SMO (SISMO) and sequential SMO (SESMO) frameworks. A gradient-based algorithm is then exploited to jointly optimize the source and mask. Subsequently, this paper studies and compares the performance of individual source optimization (SO), individual mask optimization (MO), SISMO, and SESMO. Finally, a hybrid SMO (HSMO) approach is proposed to take full advantage of SO, SISMO, and MO, consequently achieving superior performance.

© 2012 Optical Society of America

OCIS Codes
(100.3190) Image processing : Inverse problems
(110.4980) Imaging systems : Partial coherence in imaging
(110.5220) Imaging systems : Photolithography
(110.2945) Imaging systems : Illumination design

ToC Category:
Image Processing

History
Original Manuscript: August 27, 2012
Revised Manuscript: December 2, 2012
Manuscript Accepted: December 4, 2012
Published: December 19, 2012

Citation
Xu Ma, Chunying Han, Yanqiu Li, Lisong Dong, and Gonzalo R. Arce, "Pixelated source and mask optimization for immersion lithography," J. Opt. Soc. Am. A 30, 112-123 (2013)
http://www.opticsinfobase.org/josaa/abstract.cfm?URI=josaa-30-1-112

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