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Journal of the Optical Society of America A

Journal of the Optical Society of America A


  • Editor: Franco Gori
  • Vol. 31, Iss. 4 — Apr. 1, 2014
  • pp: 879–885

In-plane scattering patterns from a complex dielectric grating at the normal and oblique incidence

Yu-Bin Chen, I-Chuan Ho, Feng-Cheng Chiu, and Chia-Sheng Chang  »View Author Affiliations

JOSA A, Vol. 31, Issue 4, pp. 879-885 (2014)

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The in-plane scattering patterns from a complex dielectric grating were both numerically and experimentally studied in contrast to those from well-known metallic gratings. The incidence was the transverse electric or transverse magnetic wave of wavelength λ=660nm. The grating profile was complex with a period Λ=7.0μm, while the material was lightly doped crystalline silicon. Patterns of the electric field, magnetic field, and spatial intensity distribution were demonstrated at the normal (θi=0°) and oblique (θi=+30°) incidence. Electric and magnetic fields were presented in the near field as well as the far field. The measured power ratio within 90°θr+90° was plotted. Their major peaks and the numerically obtained diffraction efficiency of 21 orders (10m+10 or 15m+5) of diffracted waves occurred at the same θr. Other peaks and stair-like shoulders of major peaks also exhibited in spectra.

© 2014 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(160.6000) Materials : Semiconductor materials
(290.5820) Scattering : Scattering measurements

ToC Category:
Diffraction and Gratings

Original Manuscript: October 18, 2013
Revised Manuscript: February 10, 2014
Manuscript Accepted: March 3, 2014
Published: March 31, 2014

Yu-Bin Chen, I-Chuan Ho, Feng-Cheng Chiu, and Chia-Sheng Chang, "In-plane scattering patterns from a complex dielectric grating at the normal and oblique incidence," J. Opt. Soc. Am. A 31, 879-885 (2014)

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