Abstract

A new representation for the D log E curve for photographic emulsions, based on the Fermi formula, is presented. This representation uses easily measured photometric parameters and is conveniently adapted for different kinds of absorption holographic recording materials. The corresponding transmittance-versus-exposure curve is used to calculate the influence of film nonlinearity on Fourier-transform hologram-recording parameters.

© 1987 Optical Society of America

Model for analyzing the effects of processing on recording material in thick holograms

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