Mask optimization approaches in optical lithography based on a vector imaging model

• Abstract

• JOSA A, Vol. 29, Issue 7, pp. 1300-1312 (July 2012)
• Xu Ma, Yanqiu Li, Lisong Dong

Coherency matrix formulation for partially coherent imaging to evaluate the degree of coherence for image

• Abstract

• JOSA A, Vol. 29, Issue 8, pp. 1529-1536 (August 2012)
• Kenji Yamazoe

Two models for partially coherent imaging

• Abstract

• JOSA A, Vol. 29, Issue 12, pp. 2591-2597 (December 2012)
• Kenji Yamazoe

Pixelated source and mask optimization for immersion lithography

• Abstract

• JOSA A, Vol. 30, Issue 1, pp. 112-123 (January 2013)
• Xu Ma, Chunying Han, Yanqiu Li, Lisong Dong, Gonzalo R. Arce

Beyond the classical Rayleigh limit with twisted light

• Abstract

• Optics Letters, Vol. 37, Issue 13, pp. 2595-2597 (July 2012)
• Zhisong Tong, Olga Korotkova

Single-exposure complementary aperture phase microscopy with polarization encoding

• Abstract

• Optics Letters, Vol. 37, Issue 18, pp. 3798-3800 (September 2012)
• Kengyeh K. Chu, Jerome Mertz

Optical image encryption with spatially incoherent illumination

• Abstract

• Optics Letters, Vol. 38, Issue 8, pp. 1289-1291 (April 2013)
• Jinliang Zang, Zhenwei Xie, Yan Zhang

Convolution-variation separation method for efficient modeling of optical lithography

• Abstract

• Optics Letters, Vol. 38, Issue 13, pp. 2168-2170 (July 2013)
• Shiyuan Liu, Xinjiang Zhou, Wen Lv, Shuang Xu, Haiqing Wei

Enhanced resolution and throughput of Fresnel incoherent correlation holography (FINCH) using dual diffractive lenses on a spatial light modulator (SLM)

• Abstract
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• Optics Express, Vol. 20, Issue 8, pp. 9109-9121 (April 2012)
• Barak Katz, Joseph Rosen, Roy Kelner, Gary Brooker

Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model

• Abstract
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• Optics Express, Vol. 20, Issue 13, pp. 14272-14283 (June 2012)
• Shiyuan Liu, Shuang Xu, Xiaofei Wu, Wei Liu

Analytical and experimental determination of signal-to-noise ratio and figure of merit in three phase-contrast imaging techniques

• Abstract
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• Optics Express, Vol. 20, Issue 25, pp. 27670-27690 (December 2012)
• P.C. Diemoz, A. Bravin, M. Langer, P. Coan

Wigner function measurement using a lenslet array

• Abstract
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• Optics Express, Vol. 21, Issue 9, pp. 10511-10525 (May 2013)
• Lei Tian, Zhengyun Zhang, Jonathan C. Petruccelli, George Barbastathis

The transport of intensity equation for optical path length recovery using partially coherent illumination

• Abstract
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• Optics Express, Vol. 21, Issue 12, pp. 14430-14441 (June 2013)
• Jonathan C. Petruccelli, Lei Tian, George Barbastathis

Off-axis setup taking full advantage of incoherent illumination in coherence-controlled holographic microscope

• Abstract
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• Optics Express, Vol. 21, Issue 12, pp. 14747-14762 (June 2013)
• Tomáš Slabý, Pavel Kolman, Zbyněk Dostál, Martin Antoš, Martin Lošťák, Radim Chmelík

Kernel-based parametric analytical model of source intensity distributions in lithographic tools

• Abstract

• Applied Optics, Vol. 51, Issue 10, pp. 1479-1486 (April 2012)
• Shiyuan Liu, Wei Liu, Xinjiang Zhou, Peng Gong

Partially coherent light-emitting diode illumination for video-rate in-line holographic microscopy

• Abstract
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• Applied Optics, Vol. 51, Issue 13, pp. 2333-2340 (May 2012)
• Paul Petruck, Rainer Riesenberg, Richard Kowarschik

Coherence requirement in digital holography

• Abstract

• Applied Optics, Vol. 52, Issue 1, pp. A326-A335 (January 2013)
• Daniel Claus, Daciana Iliescu, John M. Rodenburg

Numerical modeling of spatial coherence using the elementary function method

• Abstract

• Applied Optics, Vol. 52, Issue 12, pp. 2815-2827 (April 2013)
• Arlene Smith, Christopher Dainty

Block-based mask optimization for optical lithography

• Abstract

• Applied Optics, Vol. 52, Issue 14, pp. 3351-3363 (May 2013)
• Xu Ma, Zhiyang Song, Yanqiu Li, Gonzalo R. Arce

Hybrid source mask optimization for robust immersion lithography

• Abstract

• Applied Optics, Vol. 52, Issue 18, pp. 4200-4211 (June 2013)
• Xu Ma, Chunying Han, Yanqiu Li, Bingliang Wu, Zhiyang Song, Lisong Dong, Gonzalo R. Arce