Performance enhancements to absorbance-modulation optical lithography. I. Plasmonic reflector layers

• Abstract

• JOSA A, Vol. 28, Issue 11, pp. 2209-2217 (November 2011)
• John E. Foulkes, Richard J. Blaikie

Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses

• Abstract

• JOSA A, Vol. 28, Issue 11, pp. 2218-2225 (November 2011)
• John E. Foulkes, Richard J. Blaikie

Integral equation analysis and optimization of 2D layered nanolithography masks by complex images Green’s function technique in TM polarization

• Abstract

• JOSA A, Vol. 29, Issue 5, pp. 748-756 (May 2012)
• Mohammad Haghtalab, Reza Faraji-Dana

Mask optimization approaches in optical lithography based on a vector imaging model

• Abstract

• JOSA A, Vol. 29, Issue 7, pp. 1300-1312 (July 2012)
• Xu Ma, Yanqiu Li, Lisong Dong

Pixelated source and mask optimization for immersion lithography

• Abstract

• JOSA A, Vol. 30, Issue 1, pp. 112-123 (January 2013)
• Xu Ma, Chunying Han, Yanqiu Li, Lisong Dong, Gonzalo R. Arce

Patterned cholesteric liquid crystal polymer film

• Abstract

• JOSA A, Vol. 30, Issue 2, pp. 252-258 (February 2013)
• Wei-Liang Hsu, Ji Ma, Graham Myhre, Kaushik Balakrishnan, Stanley Pau

Image enhancement for flat and rough film plasmon superlenses by adding loss

• Abstract

• JOSA B, Vol. 28, Issue 10, pp. 2499-2509 (October 2011)
• Haogang Wang, J. Quinn Bagley, Leung Tsang, Shaowu Huang, Kung-Hau Ding, Akira Ishimaru

Analytical approach to the impact of polarization aberration on lithographic imaging

• Abstract

• Optics Letters, Vol. 37, Issue 11, pp. 2061-2063 (June 2012)
• Yuanying Tu, Xiangzhao Wang, Sikun Li, Yuting Cao

Through nanohole formation in thin metallic film by single nanosecond laser pulses using optical dielectric apertureless probe

• Abstract

• Optics Letters, Vol. 38, Issue 9, pp. 1452-1454 (May 2013)
• Y. N. Kulchin, O. B. Vitrik, A. A. Kuchmizhak, A. V. Nepomnyashchii, A. G. Savchuk, A. A. Ionin, S. I. Kudryashov, S. V. Makarov

Pixelated source mask optimization for process robustness in optical lithography

• Abstract
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• Optics Express, Vol. 19, Issue 20, pp. 19384-19398 (September 2011)
• Ningning Jia, Edmund Y. Lam

Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model

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• Optics Express, Vol. 20, Issue 13, pp. 14272-14283 (June 2012)
• Shiyuan Liu, Shuang Xu, Xiaofei Wu, Wei Liu

Hotspot-aware fast source and mask optimization

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• Optics Express, Vol. 20, Issue 19, pp. 21792-21804 (September 2012)
• Jia Li, Yijiang Shen, Edmund Y. Lam

Evidence of speckle in extreme-UV lithography

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• Optics Express, Vol. 20, Issue 23, pp. 25970-25978 (November 2012)
• Alessandro Vaglio Pret, Roel Gronheid, Jan Engelen, Pei-Yang Yan, Michael J. Leeson, Todd R. Younkin

Efficient source and mask optimization with augmented Lagrangian methods in optical lithography

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• Optics Express, Vol. 21, Issue 7, pp. 8076-8090 (April 2013)
• Jia Li, Shiyuan Liu, Edmund Y. Lam

Optimal 3D phase-shifting masks in partially coherent illumination

• Abstract

• Applied Optics, Vol. 50, Issue 28, pp. 5567-5576 (October 2011)
• Xu Ma, Gonzalo R. Arce, Yanqiu Li

Circular Fibonacci gratings

• Abstract

• Applied Optics, Vol. 50, Issue 31, pp. G142-G148 (November 2011)
• Nan Gao, Yuchao Zhang, Changqing Xie

Kernel-based parametric analytical model of source intensity distributions in lithographic tools

• Abstract

• Applied Optics, Vol. 51, Issue 10, pp. 1479-1486 (April 2012)
• Shiyuan Liu, Wei Liu, Xinjiang Zhou, Peng Gong

Gradual tilting exposure photo and nano lithography technique

• Abstract

• Applied Optics, Vol. 51, Issue 16, pp. 3329-3337 (June 2012)
• Z. Kolahdouz, J. Koohsorkhi, M. A. Cheraghi, M. Saviz, S. Mohajerzadeh

Numerical modeling of spatial coherence using the elementary function method

• Abstract

• Applied Optics, Vol. 52, Issue 12, pp. 2815-2827 (April 2013)
• Arlene Smith, Christopher Dainty

Block-based mask optimization for optical lithography

• Abstract

• Applied Optics, Vol. 52, Issue 14, pp. 3351-3363 (May 2013)
• Xu Ma, Zhiyang Song, Yanqiu Li, Gonzalo R. Arce