Abstract

The theory of coma aberration measurement for aerial image sidelobe peaks is extended from coherent illumination to partial illumination. We prove that the intensity difference between the two peaks is linear to the amount of coma aberration in the partially coherent case. Using weak diffraction approximation, we analytically reveal the coherence dependency of the aberration measurement sensitivity for a single line in a bright field. We confirm that our derived formulas are well matched with the numerical lithography simulation results. These results provide guidelines for the measurement condition; higher aberration sensitivity is available under the higher illumination pupil coherence.

© 2015 Optical Society of America

Theoretical analysis of coma aberration measurement for aerial image sidelobe peaks

Kyoichi Suwa, Satoshi Yashiki, Shigeru Hirukawa, and Tomoya Noda
Appl. Opt. 53(11) 2494-2506 (2014)

Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

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Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination

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