Direct measurement of 248- and 193-nm excimer-induced densification in silica–germania waveguide blanks
JOSA B, Vol. 16, Issue 10, pp. 1672-1679 (1999)
http://dx.doi.org/10.1364/JOSAB.16.001672
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Abstract
The densification of a waveguide blank of composition 14GeO2:86SiO2 produced by 193- and 248-nm excimer exposure was measured by an interferometric technique. With the aid of a finite-element model, we derive the unconstrained densification from the experimentally determined optical phase shift. The densification versus exposure can be fitted to a power law and is compared with the behavior of fused silica. Again, with the finite-element model, an estimate is made of the refractive-index change that would be produced in a single-mode fiber. For the exposure levels typically used for the 248-nm exposure, the densification contribution to the optical index change is found to be negligible for this composition. On the other hand, for the high 193-nm exposure, the densification contribution can be dominant.
© 1999 Optical Society of America
[Optical Society of America ]
OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(060.2340) Fiber optics and optical communications : Fiber optics components
(140.3330) Lasers and laser optics : Laser damage
(140.3390) Lasers and laser optics : Laser materials processing
(160.2750) Materials : Glass and other amorphous materials
(160.5320) Materials : Photorefractive materials
Citation
Nicholas F. Borrelli, Douglas C. Allan, and Robert A. Modavis, "Direct measurement of 248- and 193-nm excimer-induced densification in silica–germania waveguide blanks," J. Opt. Soc. Am. B 16, 1672-1679 (1999)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-16-10-1672
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