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Two-photon-resonant difference-frequency mixing with an ArF excimer laser: vacuum-ultraviolet generation and multiphoton spectroscopy

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Abstract

Two-photon-resonant difference-frequency generation using an ArF excimer laser provides widely tunable vacuum-ultraviolet (VUV) radiation at high pulse energies. Two-photon resonances in H2, Kr, and Hd are within the tuning range of the ArF laser. With this technique we have directly measured >65 µJ at 133 nm. H2 has a significantly smaller phase mismatch than Kr, leading to more efficient VUV generation, particularly at shorter VUV wavelengths. However, mixing in H2 also produces additional VUV lines from two-photon excited amplified spontaneous emission. We have observed new amplified spontaneous-emission lines produced in this manner. H2 is ineffective at generation of Lyman-α radiation owing to the production of H atoms. With a phase-matched mixture of Kr and Ar, we have directly measured 7 µJ at Lyman-α. A physical basis for the asymmetric tuning profile in this gas mixture is presented. With light from this VUV source we have performed 1+1 resonantly enhanced multiphoton ionization in Xe at 147 nm and two-photon-excited fluorescence in Ne at 133 nm.

© 2000 Optical Society of America

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