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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Editor: G. I. Stegeman
  • Vol. 23, Iss. 3 — Mar. 1, 2006
  • pp: 461–467

Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography

David O. S. Melville and Richard J. Blaikie  »View Author Affiliations

JOSA B, Vol. 23, Issue 3, pp. 461-467 (2006)

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An experimental comparison of the performance of single- and double-layer planar lens lithography has been carried out. A direct comparison is made with a single 50 nm silver lens and a double silver lens with two 30 nm layers. Sub-diffraction-limited features have been imaged in both cases, with dense grating periods down to 145 and 170 nm for the single- and double-layered stacks, respectively. For the same total thickness of silver, the resolution limit is qualitatively better for a double-layer stack. However, pattern fidelity is reduced in the double-layer experiments, owing to increased surface roughness. Finite-difference time-domain simulations are also presented to back up the experimental results.

© 2006 Optical Society of America

OCIS Codes
(110.2990) Imaging systems : Image formation theory
(110.5220) Imaging systems : Photolithography
(160.4760) Materials : Optical properties
(260.1960) Physical optics : Diffraction theory
(310.6860) Thin films : Thin films, optical properties

ToC Category:

Original Manuscript: July 5, 2005
Revised Manuscript: October 26, 2005
Manuscript Accepted: October 26, 2005

David O. S. Melville and Richard J. Blaikie, "Experimental comparison of resolution and pattern fidelity in single- and double-layer planar lens lithography," J. Opt. Soc. Am. B 23, 461-467 (2006)

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