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Journal of the Optical Society of America B

Journal of the Optical Society of America B

| OPTICAL PHYSICS

  • Editor: G. I. Stegeman
  • Vol. 23, Iss. 9 — Sep. 1, 2006
  • pp: 1815–1821

Behavior of 157 nm excimer-laser-induced refractive index changes in silica

Charlene M. Smith and Nicholas F. Borrelli  »View Author Affiliations


JOSA B, Vol. 23, Issue 9, pp. 1815-1821 (2006)
http://dx.doi.org/10.1364/JOSAB.23.001815


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Abstract

This study describes the observation of large induced refractive index changes produced by 157 nm excimer laser exposure in high-purity synthetic silica glasses. With 157 nm exposure, large induced changes are observed within a few hundred thousand pulses of exposure. Similar to 193 nm exposures, exposure with polarized 157 nm light yields polarization-induced birefringence (PIB). However, the 157 nm exposure also exhibits a behavior not observed with 193 nm exposures; namely, the initial response of the glass is a decrease in refractive index, followed by an increase with continued exposure. An explanation of the behaviors for both wavelength results is proposed where the induced refractive index is considered to arise from two different concurrent phenomena. One produces a decreased refractive index and also accounts for the PIB. The other, which accounts for the increased refractive index, is associated with an isotropic laser-induced volume change.

© 2006 Optical Society of America

OCIS Codes
(140.2180) Lasers and laser optics : Excimer lasers
(160.2750) Materials : Glass and other amorphous materials
(350.1820) Other areas of optics : Damage

ToC Category:
Materials

History
Original Manuscript: March 20, 2006
Manuscript Accepted: April 27, 2006

Citation
Charlene M. Smith and Nicholas F. Borrelli, "Behavior of 157 nm excimer-laser-induced refractive index changes in silica," J. Opt. Soc. Am. B 23, 1815-1821 (2006)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-23-9-1815


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References

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  19. The 150 ppm OH glass was exposed with polarized light for only one fluence, so PIB reciprocity cannot be plotted.
  20. We have also done exposures of the 1200 ppm OH glass using an unpolarized 172 nm excimer lamp. Under these conditions we see similar behavior to that with 157 nm exposures, specifically, initial decreased refractive index followed by increased refractive index with continued exposure. It appears that the 172 nm induced behavior could be equally described by the formulation of Eq. , with the f− term dominating.
  21. U. Natura, O. Sohr, R. Martin, M. Kahlke, and G. Fasold, "Mechanisms of radiation induced defect generation in fused silica," in Laser-Induced Damage in Optical Materials, G.J.Exharos, A.H.Guentheer, N.Kaiser, K.L.Lewis, M.J.Soileau, and C.J.Stolz, eds., Proc. SPIE5273, 155-164 (2003).

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