Phase-sensitive electric-field-induced second-harmonic microscopy of metal-semiconductor junctions
JOSA B, Vol. 24, Issue 10, pp. 2736-2740 (2007)
http://dx.doi.org/10.1364/JOSAB.24.002736
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Abstract
We demonstrate an electric-field-induced second-harmonic microscope that measures both amplitude and phase of imaged second-harmonic light with submicrometer spatial resolution, thus characterizing the electrostatic field variations near metal-semiconductor junctions.
© 2007 Optical Society of America
OCIS Codes
(190.2620) Nonlinear optics : Harmonic generation and mixing
(240.4350) Optics at surfaces : Nonlinear optics at surfaces
(350.5030) Other areas of optics : Phase
ToC Category:
Microscopy
History
Original Manuscript: March 5, 2007
Revised Manuscript: August 6, 2007
Manuscript Accepted: August 24, 2007
Published: September 25, 2007
Virtual Issues
Vol. 2, Iss. 11 Virtual Journal for Biomedical Optics
Citation
K. Wu, R. Carriles, and M. C. Downer, "Phase-sensitive electric-field-induced second-harmonic microscopy of metal-semiconductor junctions," J. Opt. Soc. Am. B 24, 2736-2740 (2007)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-24-10-2736
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