Analysis of extreme ultraviolet microscopy images of patterned nanostructures based on a correlation method
JOSA B, Vol. 25, Issue 7, pp. B20-B26 doi:10.1364/JOSAB.25.000B20
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- OCIS Codes:
- (100.2000) Image processing : Digital image processing
- (100.2960) Image processing : Image analysis
- (110.0180) Imaging systems : Microscopy
High-field Short Wavelengths
Citation
P. W. Wachulak, C. A. Brewer, F. Brizuela, C. S. Menoni, W. Chao, E. H. Anderson, R. A. Bartels, J. J. Rocca, and M. C. Marconi, "Analysis of extreme ultraviolet microscopy images of patterned nanostructures based on a correlation method," J. Opt. Soc. Am. B 25, B20-B26 (2008)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-25-7-B20
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- Vol. 3, Iss. 8 Virtual Journal for Biomedical Optics
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MendeleyAbstract
A method to analyze extreme ultraviolet microscopy images of nanostructures that allows for the simultaneous determination of an object's feature size and image resolution is presented. It is based on the correlation between the image and a set of templates of known resolution generated from the original image using Gaussian filters. The analysis was applied to images obtained with a Fresnel zone plate microscope that uses a 13.2 nm wavelength laser light for illumination. The object's feature size and the resolution obtained with this method are shown to be in very good agreement with independent measurements of both magnitudes.
© 2008 Optical Society of America
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History
Original Manuscript: December 21, 2007
Manuscript Accepted: January 29, 2008
Published: April 7, 2008
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Author Affiliations
Colorado State University
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