Nanoimprinting of dielectric loaded surface-plasmon-polariton waveguides using masters fabricated by 2-photon polymerization technique
JOSA B, Vol. 26, Issue 4, pp. 810-812 (2009)
http://dx.doi.org/10.1364/JOSAB.26.000810
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Abstract
We report on a method of making dielectric loaded surface-plasmon-polariton waveguides by nanoimprint lithography from master structures fabricated using two-photon polymerization. This method employing molds from polydimethylsiloxane allows rapid reproduction of waveguide structures using a large variety of resist and substrate materials. Both master and imprinted samples are characterized and compared. Measurements are performed on the imprinted samples using leakage radiation microscopy.
© 2009 Optical Society of America
OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(240.6680) Optics at surfaces : Surface plasmons
(160.4236) Materials : Nanomaterials
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(160.5335) Materials : Photosensitive materials
(250.5403) Optoelectronics : Plasmonics
ToC Category:
Optics at Surfaces
History
Original Manuscript: December 17, 2008
Manuscript Accepted: February 19, 2009
Published: March 26, 2009
Citation
Andreas Seidel, Christoph Ohrt, Sven Passinger, Carsten Reinhardt, Roman Kiyan, and Boris N. Chichkov, "Nanoimprinting of dielectric loaded surface-plasmon-polariton waveguides using masters fabricated by 2-photon polymerization technique," J. Opt. Soc. Am. B 26, 810-812 (2009)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-26-4-810
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