OSA's Digital Library

Journal of the Optical Society of America B

Journal of the Optical Society of America B

| OPTICAL PHYSICS

  • Editor: Grover Swartzlander
  • Vol. 30, Iss. 12 — Dec. 1, 2013
  • pp: 3272–3277

Robust design of a silver-dielectric near-field superlens for photolithography

Ciaran P. Moore and Richard J. Blaikie  »View Author Affiliations


JOSA B, Vol. 30, Issue 12, pp. 3272-3277 (2013)
http://dx.doi.org/10.1364/JOSAB.30.003272


View Full Text Article

Enhanced HTML    Acrobat PDF (1143 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

The transmission characteristics of silver–dielectric superlenses in photolithographic applications are studied here and are shown to introduce significant spatial frequency-specific artifacts into images of subwavelength patterns when the superlens is below a certain thickness. These artifacts have a negative impact on the fidelity of patterns produced by photoresists exposed through superlenses, which is not ideal in photolithography applications. The cause of the artifacts is identified as a mismatch between the dc transmission coefficient and the peak transmission coefficient of the superlens, which is normally placed beyond the conventional diffraction limit. We show that this mismatch can be corrected by increasing the thickness of the component layers within the superlens, with the result that the total transmission through the superlens is reduced but the range of spatial frequencies that can be transmitted without severe distortion is increased. Analyses and examples are presented for superlens designs that maximize the spatial frequency bandwidth over which good imaging can be expected; systems with a total thickness of 120–140 nm are optimal, delivering superresolution imaging over spatial frequency bandwidths of up to 6.6μm1.

© 2013 Optical Society of America

OCIS Codes
(100.1160) Image processing : Analog optical image processing
(100.6640) Image processing : Superresolution
(110.4850) Imaging systems : Optical transfer functions
(260.2110) Physical optics : Electromagnetic optics
(110.3925) Imaging systems : Metrics

ToC Category:
Image Processing

History
Original Manuscript: May 28, 2013
Revised Manuscript: September 13, 2013
Manuscript Accepted: October 17, 2013
Published: November 21, 2013

Virtual Issues
Vol. 9, Iss. 2 Virtual Journal for Biomedical Optics

Citation
Ciaran P. Moore and Richard J. Blaikie, "Robust design of a silver-dielectric near-field superlens for photolithography," J. Opt. Soc. Am. B 30, 3272-3277 (2013)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-30-12-3272

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited