Improved laser-damage-resistant polymethyl methacrylate
JOSA B, Vol. 1, Issue 6, pp. 853-856 (1984)
http://dx.doi.org/10.1364/JOSAB.1.000853
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Abstract
The effects of moderate monomer purification before polymerization on the bulk laser-damage properties of polymethyl methacrylate were studied with 1.06-μm-wavelength, 8-nsec-FWHM, 33-μm spot-radius pulses from a Q-switched Nd:YAG laser. The results show that monomer purification can more than double the single-shot damage threshold and significantly raise the one-pulse-per-second low-level multiple-shot damage asymptote of the material. Scattered, depolarized helium-neon laser light and certain characteristics of the single- and multipleshot data strongly suggest that removal of micrometer-sized dust is the primary cause of the improved damage resistance in the purified material.
© 1984 Optical Society of America
Citation
R. M. O’Connell, A. B. Romberger, A. A. Shaffer, T. T. Saito, T. F. Deaton, and K. E. Seigenthaler, "Improved laser-damage-resistant polymethyl methacrylate," J. Opt. Soc. Am. B 1, 853-856 (1984)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-1-6-853
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