Thermally poled silicate thin films with large second-harmonic generation
JOSA B, Vol. 15, Issue 1, pp. 421-425 (1998)
http://dx.doi.org/10.1364/JOSAB.15.000421
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Abstract
Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices.
© 1998 Optical Society of America
[Optical Society of America ]
OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(160.6030) Materials : Silica
(190.0190) Nonlinear optics : Nonlinear optics
(310.0310) Thin films : Thin films
Citation
O. Sugihara, M. Nakanishi, H. Fujimura, C. Egami, and N. Okamoto, "Thermally poled silicate thin films with large second-harmonic generation," J. Opt. Soc. Am. B 15, 421-425 (1998)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-15-1-421
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