Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices.
© 1998 Optical Society of America
O. Sugihara, M. Nakanishi, H. Fujimura, C. Egami, and N. Okamoto, "Thermally poled silicate thin films with large second-harmonic generation," J. Opt. Soc. Am. B 15, 421-425 (1998)