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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Vol. 16, Iss. 4 — Apr. 1, 1999
  • pp: 605–608

Two-photon exposure of photographic film

Pu-Wei Wu, Bruce Dunn, Eli Yablonovitch, Vinh Doan, and Benjamin J. Schwartz  »View Author Affiliations

JOSA B, Vol. 16, Issue 4, pp. 605-608 (1999)

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Photographic film has commonly been exposed by a single-photon absorption mechanism. We determine the conditions for film exposure by direct two-photon absorption. Using subpicosecond laser pulses, we find that two-photon exposure for commercial film has a threshold fluence and an intensity of 0.0008 J/cm2 and 0.0066 TW/cm2, respectively, well below the optical damage threshold. Multiphoton photography has the potential for higher spatial resolution and affords an opportunity for three-dimensional image storage.

© 1999 Optical Society of America

OCIS Codes
(110.5200) Imaging systems : Photography
(190.4180) Nonlinear optics : Multiphoton processes

Pu-Wei Wu, Bruce Dunn, Eli Yablonovitch, Vinh Doan, and Benjamin J. Schwartz, "Two-photon exposure of photographic film," J. Opt. Soc. Am. B 16, 605-608 (1999)

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  1. Kirk-Othmer, ed., Encyclopedia of Chemical Technology (Wiley, New York 1978), Vol. 17, p. 611.
  2. E. Yablonovitch and R. B. Vrijen, “Optical projection lithography at half the Rayleigh resolution limit by two photon exposure,” Opt. Eng. (Bellingham) (to be published).
  3. S. Maruo, O. Nakamura, and S. Kawata, “Three-dimensional microfabrication with two-photon-absorbed photopolymerization,” Opt. Lett. 22, 132–134 (1997); E. S. Wu, J. H. Strickler, W. R. Harrell, and W. W. Webb, “Two-photon lithography for microelectronic application,” in Optical/Laser Microlithography V, J. J. D. Cuthbert, ed., Proc. SPIE 1674, 776–782 (1992); J. H. Strickler and W. W. Webb, “Three-dimensional optical data storage in refractive media by 2-photon point excitation,” Opt. Lett. OPLEDP 16, 1780–1782 (1991). [CrossRef] [PubMed]
  4. I. M. Catalano, A. Cingolani, and M. Lepore, “Two-photon absorption spectra of direct and indirect materials: ZnO and AgCl,” Phys. Rev. B 33, 7270–7273 (1986). [CrossRef]
  5. M. Casalboni, F. Crisanti, R. Francini, and U. M. Grassano, “Two-photon spectroscopy in AgCl,” Solid State Commun. 35, 833–836 (1980). [CrossRef]
  6. Commercial film, Kodak technical data publication F-16 (Eastman Kodak, Rochester, N.Y.).
  7. AZO photographic paper, Kodak technical data publication G-10 (Eastman Kodak, Rochester, N.Y.).
  8. J. Kruger and W. Kautek, “Femtosecond-pulse visible laser processing of transparent materials,” Appl. Surf. Sci. 96–98, 430–438 (1996). [CrossRef]

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