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Journal of the Optical Society of America B

Journal of the Optical Society of America B

| OPTICAL PHYSICS

  • Vol. 16, Iss. 4 — Apr. 1, 1999
  • pp: 605–608

Two-photon exposure of photographic film

Pu-Wei Wu, Bruce Dunn, Eli Yablonovitch, Vinh Doan, and Benjamin J. Schwartz  »View Author Affiliations


JOSA B, Vol. 16, Issue 4, pp. 605-608 (1999)
http://dx.doi.org/10.1364/JOSAB.16.000605


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Abstract

Photographic film has commonly been exposed by a single-photon absorption mechanism. We determine the conditions for film exposure by direct two-photon absorption. Using subpicosecond laser pulses, we find that two-photon exposure for commercial film has a threshold fluence and an intensity of 0.0008 J/cm2 and 0.0066 TW/cm2, respectively, well below the optical damage threshold. Multiphoton photography has the potential for higher spatial resolution and affords an opportunity for three-dimensional image storage.

© 1999 Optical Society of America

OCIS Codes
(110.5200) Imaging systems : Photography
(190.4180) Nonlinear optics : Multiphoton processes

Citation
Pu-Wei Wu, Bruce Dunn, Eli Yablonovitch, Vinh Doan, and Benjamin J. Schwartz, "Two-photon exposure of photographic film," J. Opt. Soc. Am. B 16, 605-608 (1999)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-16-4-605


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References

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