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Journal of the Optical Society of America B

Journal of the Optical Society of America B

| OPTICAL PHYSICS

  • Vol. 17, Iss. 7 — Jul. 1, 2000
  • pp: 1279–1290

Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas

M. A. Klosner and W. T. Silfvast  »View Author Affiliations


JOSA B, Vol. 17, Issue 7, pp. 1279-1290 (2000)
http://dx.doi.org/10.1364/JOSAB.17.001279


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Abstract

We have identified intense extreme-ultraviolet emission spectra within the 5–20-nm wavelength region, originating from transitions in the Xe8+,Xe9+,Xe10+, and Xe11+ ion species, which were generated in high-current pulsed capillary discharges operating with xenon gas. We have also obtained a time-dependent estimate of the plasma electron temperature for these plasmas at peak pulsed current densities in the range of 400–800 kA/cm2.

© 2000 Optical Society of America

OCIS Codes
(020.0020) Atomic and molecular physics : Atomic and molecular physics
(230.0230) Optical devices : Optical devices
(230.6080) Optical devices : Sources
(300.0300) Spectroscopy : Spectroscopy
(300.6210) Spectroscopy : Spectroscopy, atomic

Citation
M. A. Klosner and W. T. Silfvast, "Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas," J. Opt. Soc. Am. B 17, 1279-1290 (2000)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-17-7-1279


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References

  1. M. A. Klosner and W. T. Silfvast, “Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm wavelength region,” Opt. Lett. 23, 1609–1611 (1998). [CrossRef]
  2. M. A. Klosner, “Intense capillary discharge plasma extreme-ultraviolet sources for EUV lithography and other EUV imaging applications,” Ph.D. dissertation (University of Central Florida, Orlando, Florida, 1998).
  3. D. Stearns, R. Rosen, and S. Vernon, “Multilayer mirror technology for soft x-ray projection lithography,” Appl. Opt. 32, 6952–6959 (1993). [CrossRef] [PubMed]
  4. K. M. Skulina, C. S. Alford, R. M. Bionta, D. M. Makowiecki, E. M. Gullikson, R. Soufli, J. B. Kortright, and J. H. Underwood, “Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet,” Appl. Opt. 34, 3727–3730 (1995). [CrossRef] [PubMed]
  5. N. M. Ceglio, A. M. Hawryluk, and G. E. Sommargren, “Front-end design issues in soft-x-ray projection lithography,” Appl. Opt. 34, 7050–7056 (1993). [CrossRef]
  6. E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994).
  7. J. Blackburn, P. K. Carroll, J. Costello, and G. O’Sullivan, “Spectra of Xe VII, VII, and IX in the extreme ultraviolet: 4d–mp,  nf transitions,” J. Opt. Soc. Am. 73, 1325–1329 (1983). [CrossRef]
  8. V. Kaufman, J. Sugar, and J. L. Tech, “Analysis of the 4d9–4d85p transitions in nine-times ionized xenon (Xe X),” J. Opt. Soc. Am. 73, 691–693 (1983). [CrossRef]
  9. G. O’Sullivan, “Charge-dependent wavefunction collapse in ionized xenon,” J. Phys. B 15, L765–L771 (1982). [CrossRef]
  10. W. T. Silfvast.
  11. M. McGeoch, “Radio-frequency pre-ionized xenon z-pinch source for extreme ultraviolet lithography,” Appl. Opt. 37, 1651–1658 (1998). [CrossRef]
  12. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, and R. Lebert, “Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma,” Appl. Opt. 38, 5413–5417 (1999). [CrossRef]
  13. I. Hutchinson, Principles of Plasma Diagnostics (Cambridge University Press, New York, 1987).
  14. Y. Raizer and Y. Zel’dovich, Physics of Shock Waves and High-Temperature Hydrodynamic Phenomena (Academic, New York, 1966).
  15. J. J. Rocca, D. C. Beethe, and M. C. Marconi, “Proposal for soft-x-ray and XUV lasers in capillary discharges,” Opt. Lett. 13, 565–567 (1988). [CrossRef] [PubMed]
  16. M. Pöckl, M. Hebenstreit, T. Neger, and F. Aumayr, “Time-dependent collisional-radiative model for capillary discharge plasmas,” J. Appl. Phys. 76, 733–737 (1994). [CrossRef]
  17. G. O’Sullivan and P. Carroll, “4d–4f emission resonances in laser-produced plasmas,” J. Opt. Soc. Am. 71, 227–230 (1981). [CrossRef]
  18. L. House, “Ionization equilibrium of the elements H to Fe,” Astrophys. J., Suppl. 81, 307–328 (1963).

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