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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Vol. 20, Iss. 4 — Apr. 1, 2003
  • pp: 752–759

Reflection of light in a long-wavelength approximation from an N-layer system of inhomogeneous dielectric films and optical diagnostics of ultrathin layers. I. Absorbing substrate

Peep Adamson  »View Author Affiliations

JOSA B, Vol. 20, Issue 4, pp. 752-759 (2003)

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The reflection of s- and p-polarized light from an N-layer system of inhomogeneous ultrathin dielectric films upon absorbing homogeneous substrates is investigated. The first-order approximate expressions for differential reflectance and changes in the ellipsometric parameters that are caused by a multilayer system are obtained in the long-wavelength limit. The possibilities of using these formulas for resolving the inverse problem for inhomogeneous ultrathin films are discussed. A number of novel options are developed for simultaneously determining the dielectric constant and thickness of a homogeneous ultrathin film by differential reflectance and ellipsometric measurements.

© 2003 Optical Society of America

OCIS Codes
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(120.5700) Instrumentation, measurement, and metrology : Reflection
(240.0310) Optics at surfaces : Thin films
(260.2110) Physical optics : Electromagnetic optics
(260.2130) Physical optics : Ellipsometry and polarimetry
(310.6860) Thin films : Thin films, optical properties

Peep Adamson, "Reflection of light in a long-wavelength approximation from an N-layer system of inhomogeneous dielectric films and optical diagnostics of ultrathin layers. I. Absorbing substrate," J. Opt. Soc. Am. B 20, 752-759 (2003)

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