The choice of an exposure schedule that maximizes the uniformity and capacity of a holographic recording medium is of critical importance in ensuring the optimum performance of any potential holographic data storage scheme. We propose a methodology to identify an optimum exposure schedule for photopolymer materials governed by the nonlocal polymerization-driven diffusion model. Using this model, the relationship between the material properties (nonlocality and nonlinearity), the recording conditions and the schedule are clarified. In this way, we provide a first-order comparison of the behavior of particular classes of photopolymer materials for use as holographic storage media. We demonstrate, using the nonlocal polymerization-driven diffusion model, that the exposure schedule is independent of the number of gratings to be recorded and that the optimum schedule may necessitate leaving unpolymerized monomer at the end of the recording process.

© 2004 Optical Society of America

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