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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Editor: G. I. Stegeman
  • Vol. 23, Iss. 12 — Dec. 1, 2006
  • pp: 2511–2517

Polarized IR studies of silica glasses exposed to polarized excimer radiation

Charlene M. Smith, Nicholas F. Borrelli, and James E. Tingley  »View Author Affiliations

JOSA B, Vol. 23, Issue 12, pp. 2511-2517 (2006)

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Silica glass exhibits a permanent anisotropic response, polarization-induced birefringence (PIB), when exposed to short-wavelength polarized light. This behavior has been correlated with the OH content of the glass. In this paper we describe polarized infrared studies of silica glasses of different OH content exposed with polarized 157 nm laser light. Changes in the fundamental OH band as a consequence of exposure are shown. We find differential bleaching of a particular OH band where OH species that are oriented parallel to the incident exposing polarization undergo greater bleaching than those oriented perpendicular. The preferential bleaching as a function of exposure time correlates strongly with the evolution of PIB, leading to a bleaching model of OH that is causally linked to PIB.

© 2006 Optical Society of America

OCIS Codes
(140.2180) Lasers and laser optics : Excimer lasers
(160.2750) Materials : Glass and other amorphous materials
(350.1820) Other areas of optics : Damage

ToC Category:
Lasers and Laser Optics

Original Manuscript: July 24, 2006
Revised Manuscript: August 23, 2006
Manuscript Accepted: September 13, 2006

Charlene M. Smith, Nicholas F. Borrelli, and James E. Tingley, "Polarized IR studies of silica glasses exposed to polarized excimer radiation," J. Opt. Soc. Am. B 23, 2511-2517 (2006)

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