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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Editor: G. I. Stegeman
  • Vol. 23, Iss. 9 — Sep. 1, 2006
  • pp: 1815–1821

Behavior of 157 nm excimer-laser-induced refractive index changes in silica

Charlene M. Smith and Nicholas F. Borrelli  »View Author Affiliations

JOSA B, Vol. 23, Issue 9, pp. 1815-1821 (2006)

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This study describes the observation of large induced refractive index changes produced by 157 nm excimer laser exposure in high-purity synthetic silica glasses. With 157 nm exposure, large induced changes are observed within a few hundred thousand pulses of exposure. Similar to 193 nm exposures, exposure with polarized 157 nm light yields polarization-induced birefringence (PIB). However, the 157 nm exposure also exhibits a behavior not observed with 193 nm exposures; namely, the initial response of the glass is a decrease in refractive index, followed by an increase with continued exposure. An explanation of the behaviors for both wavelength results is proposed where the induced refractive index is considered to arise from two different concurrent phenomena. One produces a decreased refractive index and also accounts for the PIB. The other, which accounts for the increased refractive index, is associated with an isotropic laser-induced volume change.

© 2006 Optical Society of America

OCIS Codes
(140.2180) Lasers and laser optics : Excimer lasers
(160.2750) Materials : Glass and other amorphous materials
(350.1820) Other areas of optics : Damage

ToC Category:

Original Manuscript: March 20, 2006
Manuscript Accepted: April 27, 2006

Charlene M. Smith and Nicholas F. Borrelli, "Behavior of 157 nm excimer-laser-induced refractive index changes in silica," J. Opt. Soc. Am. B 23, 1815-1821 (2006)

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  1. M. Rothschild, D. J. Ehrlich, and D. C. Shaver, "Effects of excimer laser irradiation on the transmission, index of refraction and density of ultraviolet grade fused silica," Appl. Phys. Lett. 55, 1276-12785 (1989). [CrossRef]
  2. R. E. Schenker and W. G. Oldham J., "Ultraviolet-induced densification in fused silica," Appl. Phys. 82, 1065-1071 (1997).
  3. N. F. Borrelli, C. Smith, D. C. Allan, and T. P. Seward III, "Densification of fused silica under 193-nm excitation," J. Opt. Soc. Am. B 14, 1606-1615 (1997). [CrossRef]
  4. C. K. Van Peski, R. Morton, and Z. Bor, "Behavior of fused silica irradiated by low level 193-nm excimer laser for tens of billions of pulses," J. Non-Cryst. Solids 265, 285-289 (2000). [CrossRef]
  5. C. M. Smith, N. F. Borrelli, J. J. Price, and D. C. Allan, "Excimer laser-induced expansion in hydrogen-loaded silica," Appl. Phys. Lett. 78, 2452-2454 (2001). [CrossRef]
  6. V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro, and A. Grenville, "Excimer-laser-induced densification of fused silica: laser fluence and material-grade effects on the scaling law," J. Non-Cryst. Solids 244, 159-172 (1999). [CrossRef]
  7. F. Piao, W. G. Oldham, and E. E. Haller, "Ultra-violet induced densification in fused silica," J. Appl. Phys. 87, 3287-3293 (2000). [CrossRef]
  8. R. L. Sandstrom, R. G. Morton, and T. P. Duffey, "Dependence of compaction in fused silica on laser pulse width at 248-nm," in Laser Induced Damage in Optical Materials, G.J.Exarhos, A.H.Guenther, M.R.Kozlowski, K.L.Lewis, and M.J.Soileau, eds., Proc. SPIE3578, 28-30 (2003).
  9. B. Kühn, B. Uebbing, M. Stamminger, I. Radosevic, and S. Kaiser, "Compaction versus expansion behavior related to the OH content of synthetic fused silica under prolonged UV-laser irradiation," J. Non-Cryst. Solids 330, 23-32 (2003). [CrossRef]
  10. M. Mlejnek, "Viscoelastic model of photo-induced anisotropic density changes in glasses," Phys. Chem. Glasses (to be published).
  11. J. M. Algots, R. Sandstrom, W. Partlo, P. Maroevic, E. Eva, M. Gerhard, R. Lindner, and F. Stietz, "Compaction and rarefaction of fused silica with 193-nm excimer laser exposure," in Optical Microlithography XVI, A.Yen, ed., Proc. SPIE5040, 1639-1650 (2003).
  12. D. C. Allan, R. J. Araujo, C. M. Smith, and N. F. Borrelli, "Induced density changes in 193-nm excimer-laser-damaged silica glass: a kinetic model," in Optical Microlithography XVI, B.Smith, ed., Proc. SPIE 5377, 827-835 (2004).
  13. N. F. Borrelli, C. M. Smith, J. J. Price, and D. C. Allan, "Polarized excimer laser-induced birefringence in silica," Opt. Lett. 80, 219-221 (2002).
  14. G. L. Tan, M. F. Lemon, D. J. Jones, and R. H. French, "Optical properties and London dispersion interaction of amorphous and crystalline SiO2 determined by vacuum ultraviolet spectroscopy and spectroscopic ellipsometry," Phys. Rev. B 72, 1-10 (2005).
  15. G. Pacchioni and G. Ierano, "Ab initio theory of optical transitions of point defects in SiO2," Phys. Rev. B 57, 818-832 (1998). [CrossRef]
  16. G. H. Sigel, "Optical absorption of glasses," Interaction with Electromagnetic Radiation, Vol. 12 of Treatise on Materials Science and Technology (Academic, 1978), pp. 5-89.
  17. U. Neukirch, D. C. Allan, N. F. Borrelli, C. E. Heckle, M. Mlejnek, J. Moll, and C. M. Smith, "Laser-induced birefringence in fused silica from polarized lasers," in Optical Microlithography XVII, B.Smith, ed., Proc. SPIE5754, 638-645 (2005).
  18. V. S. Khotimchenko, G. M. Sochivkin, I. I. Novak, and K. N. Kuksenko, "Determining the content of hydrogen dissolved in quartz glass using the methods of Raman scattering and mass spectrometry," Zh. Prikl. Spektrosk. 46, 987-991 (1987).
  19. The 150 ppm OH glass was exposed with polarized light for only one fluence, so PIB reciprocity cannot be plotted.
  20. We have also done exposures of the 1200 ppm OH glass using an unpolarized 172 nm excimer lamp. Under these conditions we see similar behavior to that with 157 nm exposures, specifically, initial decreased refractive index followed by increased refractive index with continued exposure. It appears that the 172 nm induced behavior could be equally described by the formulation of Eq. , with the f− term dominating.
  21. U. Natura, O. Sohr, R. Martin, M. Kahlke, and G. Fasold, "Mechanisms of radiation induced defect generation in fused silica," in Laser-Induced Damage in Optical Materials, G.J.Exharos, A.H.Guentheer, N.Kaiser, K.L.Lewis, M.J.Soileau, and C.J.Stolz, eds., Proc. SPIE5273, 155-164 (2003).

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