We demonstrate an electric-field-induced second-harmonic microscope that measures both amplitude and phase of imaged second-harmonic light with submicrometer spatial resolution, thus characterizing the electrostatic field variations near metal-semiconductor junctions.
© 2007 Optical Society of America
Original Manuscript: March 5, 2007
Revised Manuscript: August 6, 2007
Manuscript Accepted: August 24, 2007
Published: September 25, 2007
Vol. 2, Iss. 11 Virtual Journal for Biomedical Optics
K. Wu, R. Carriles, and M. C. Downer, "Phase-sensitive electric-field-induced second-harmonic microscopy of metal-semiconductor junctions," J. Opt. Soc. Am. B 24, 2736-2740 (2007)