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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Editor: Henry M. Van Driel
  • Vol. 25, Iss. 1 — Jan. 1, 2008
  • pp: 60–66

Femtosecond laser damage threshold and nonlinear characterization in bulk transparent SiC materials

G. Logan DesAutels, Chris Brewer, Mark Walker, Shane Juhl, Marc Finet, Scott Ristich, Matt Whitaker, and Peter Powers  »View Author Affiliations

JOSA B, Vol. 25, Issue 1, pp. 60-66 (2008)

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Semi-insulating and conducting SiC crystalline transparent substrates were studied after being processed by femtosecond (fs) laser radiation ( 780 nm at 160 fs ). Z-scan and damage threshold experiments were performed on both SiC bulk materials to determine each sample’s nonlinear and threshold parameters. “Damage” in this text refers to an index of refraction modification as observed visually under an optical microscope. In addition, a study was performed to understand the damage threshold as a function of numerical aperture. Presented here for the first time, to the best of our knowledge, are the damage threshold, nonlinear index of refraction, and nonlinear absorption measured values.

© 2008 Optical Society of America

OCIS Codes
(190.0190) Nonlinear optics : Nonlinear optics
(190.4180) Nonlinear optics : Multiphoton processes
(190.5970) Nonlinear optics : Semiconductor nonlinear optics including MQW

ToC Category:
Nonlinear Optics

Original Manuscript: September 10, 2007
Revised Manuscript: October 15, 2007
Manuscript Accepted: October 18, 2007
Published: December 21, 2007

G. Logan DesAutels, Chris Brewer, Mark Walker, Shane Juhl, Marc Finet, Scott Ristich, Matt Whitaker, and Peter Powers, "Femtosecond laser damage threshold and nonlinear characterization in bulk transparent SiC materials," J. Opt. Soc. Am. B 25, 60-66 (2008)

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