We theoretically designed dual-beam triple exposure interference lithography to fabricate three-term diamond-like structures in SU-8 photoresist with scalable size and investigated the robustness of the optical setup against potential experimental errors. Minimal distortion could be achieved by careful selection of the angle between the bisector of the two beams and the normal of the sample surface to precompensate the anisotropic shrinkage. A small deviation of incident beam angles, however, would lead to a significant change in structural size when the angle between the two incident beams was small for a large sized structure, whereas the translational symmetry of the SU-8 structure remained reasonably close to face-centered cubic. We then experimentally demonstrate size scalable diamond-like photonic structures with the lattice symmetry and size close to the theoretical design.
© 2010 Optical Society of America
Original Manuscript: June 28, 2010
Revised Manuscript: September 24, 2010
Manuscript Accepted: September 29, 2010
Published: November 5, 2010
Xuelian Zhu, Guanquan Liang, Yongan Xu, Shih-Chieh Cheng, and Shu Yang, "Fabrication of size scalable three-dimensional photonic structures via dual-beam multiple exposure and its robustness study," J. Opt. Soc. Am. B 27, 2534-2541 (2010)