## Tailoring the high-harmonic emission in two-level systems and semiconductors by pulse shaping |

JOSA B, Vol. 29, Issue 2, pp. A36-A42 (2012)

http://dx.doi.org/10.1364/JOSAB.29.000A36

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### Abstract

The generation of specific high harmonics for an optical two-level system is elucidated. The desired emitted radiation can be induced by a carefully designed excitation pulse, which is found by a multiparameter optimization procedure. The presented mechanism can also be applied to semiconductor structures for which the calculations result in much higher emission frequencies. The optimization procedure is either performed using a genetic algorithm or a rigorous mathematical optimization technique.

© 2012 Optical Society of America

**OCIS Codes**

(190.4160) Nonlinear optics : Multiharmonic generation

(190.7110) Nonlinear optics : Ultrafast nonlinear optics

(320.5540) Ultrafast optics : Pulse shaping

(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

**History**

Original Manuscript: September 30, 2011

Revised Manuscript: November 18, 2011

Manuscript Accepted: November 23, 2011

Published: January 25, 2012

**Citation**

Matthias Reichelt, Andrea Walther, and Torsten Meier, "Tailoring the high-harmonic emission in two-level systems and semiconductors by pulse shaping," J. Opt. Soc. Am. B **29**, A36-A42 (2012)

http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-29-2-A36

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