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Journal of the Optical Society of America B

Journal of the Optical Society of America B


  • Editor: Henry van Driel
  • Vol. 29, Iss. 2 — Feb. 1, 2012
  • pp: A36–A42

Tailoring the high-harmonic emission in two-level systems and semiconductors by pulse shaping

Matthias Reichelt, Andrea Walther, and Torsten Meier  »View Author Affiliations

JOSA B, Vol. 29, Issue 2, pp. A36-A42 (2012)

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The generation of specific high harmonics for an optical two-level system is elucidated. The desired emitted radiation can be induced by a carefully designed excitation pulse, which is found by a multiparameter optimization procedure. The presented mechanism can also be applied to semiconductor structures for which the calculations result in much higher emission frequencies. The optimization procedure is either performed using a genetic algorithm or a rigorous mathematical optimization technique.

© 2012 Optical Society of America

OCIS Codes
(190.4160) Nonlinear optics : Multiharmonic generation
(190.7110) Nonlinear optics : Ultrafast nonlinear optics
(320.5540) Ultrafast optics : Pulse shaping
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

Original Manuscript: September 30, 2011
Revised Manuscript: November 18, 2011
Manuscript Accepted: November 23, 2011
Published: January 25, 2012

Matthias Reichelt, Andrea Walther, and Torsten Meier, "Tailoring the high-harmonic emission in two-level systems and semiconductors by pulse shaping," J. Opt. Soc. Am. B 29, A36-A42 (2012)

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