A surface plasmon resonant cavity capable of enhancing ultradeep subwavelength photolithography in a large area is proposed. The cavity consists of two metal films: one is etched with periodic grooves for exciting surface plasmon resonance at the metal/dielectric interface; the other below is separated by a photoresist layer. Numerical simulations show that the properties of photolithographic patterns in the cavity can be modulated by the depth of the cavity; the physical image behind the modulation is confirmed by the phase regulation of gap surface plasmons in such a system.
© 2012 Optical Society of America
Optical Design and Fabrication
Original Manuscript: September 14, 2012
Revised Manuscript: October 22, 2012
Manuscript Accepted: November 28, 2012
Published: December 21, 2012
Xu-feng Li, Xia Zhang, Ying-nan Guo, Ji-ke Meng, and Ji-lin Wei, "Function of a surface plasmon cavity for enhancing ultradeep subwavelength photolithography," J. Opt. Soc. Am. B 30, 229-232 (2013)