OSA's Digital Library

Journal of the Optical Society of America B

Journal of the Optical Society of America B

| OPTICAL PHYSICS

  • Editor: Grover Swartzlander
  • Vol. 30, Iss. 2 — Feb. 1, 2013
  • pp: 282–287

Dielectric properties of the silver–copper alloy films deposited by magnetron sputtering

Guang Yang, Xiaojian Fu, and Ji Zhou  »View Author Affiliations


JOSA B, Vol. 30, Issue 2, pp. 282-287 (2013)
http://dx.doi.org/10.1364/JOSAB.30.000282


View Full Text Article

Enhanced HTML    Acrobat PDF (1281 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

The dielectric properties of Ag–Cu alloy films prepared by direct current magnetron sputtering were studied using variable angle spectroscopy ellipsometry. The dissipate loss of Ag–Cu alloy films was increased in the short wavelength (300–450 nm) with the increase of copper addition in silver alloys. The effective medium theory model was employed to characterize the surface roughness layer in the data simulation. Two typical peaks around 1.7 and 3.2 eV were presented for Ag–Cu alloys. The dielectric functions can be manipulated by the change of alloy composition and annealing temperature.

© 2013 Optical Society of America

OCIS Codes
(160.4760) Materials : Optical properties
(310.1860) Thin films : Deposition and fabrication
(310.6860) Thin films : Thin films, optical properties
(160.4236) Materials : Nanomaterials

ToC Category:
Thin Films

History
Original Manuscript: September 6, 2012
Revised Manuscript: October 25, 2012
Manuscript Accepted: December 2, 2012
Published: January 7, 2013

Citation
Guang Yang, Xiaojian Fu, and Ji Zhou, "Dielectric properties of the silver–copper alloy films deposited by magnetron sputtering," J. Opt. Soc. Am. B 30, 282-287 (2013)
http://www.opticsinfobase.org/josab/abstract.cfm?URI=josab-30-2-282


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. S. I. Bozhevolnyi, V. S. Volkov, E. Devaux, J. Y. Laluet, and T. W. Ebbesen, “Channel plasmon subwavelength waveguide components including interferometers and ring resonators,” Nature 440, 508–511 (2006). [CrossRef]
  2. S. A. Maier and H. A. Atwater, “Plasmonics: localization and guiding of electromagnetic energy in metal/dielectric structures,” J. Appl. Phys. 98, 11101 (2005). [CrossRef]
  3. Y. Q. Fu and X. L. Zhou, “Plasmonic lenses: a review,” Plasmonics 5, 287–310 (2010). [CrossRef]
  4. J. B. Pendry, “Negative refraction makes a perfect lens,” Phys. Rev. Lett. 85, 3966–3969 (2000). [CrossRef]
  5. M. Kadic, S. Guenneau, and S. Enoch, “Transformational plasmonics: cloak, concentrator and rotator for SPPs,” Opt. Express 18, 12027–12032 (2010). [CrossRef]
  6. V. M. Shalaev, “Transforming light,” Science 322, 384–386 (2008). [CrossRef]
  7. A. Bouhelier, T. Huser, H. Tamaru, H. J. Guntherodt, D. W. Pohl, F. I. Baida, and D. Van Labeke, “Plasmon optics of structured silver films,” Phys. Rev. B 63, 155404 (2001). [CrossRef]
  8. R. E. Peale, O. Lopatiuk, J. Cleary, S. Santos, J. Henderson, D. Clark, L. Chernyak, T. A. Winningham, E. Del Barco, H. Heinrich, and W. R. Buchwald, “Propagation of high-frequency surface plasmons on gold,” J. Opt. Soc. Am. B 25, 1708–1713 (2008). [CrossRef]
  9. P. R. West, S. Ishii, G. V. Naik, N. K. Emani, V. M. Shalaev, and A. Boltasseva, “Searching for better plasmonic materials,” Laser Photon. Rev. 4, 795–808 (2010). [CrossRef]
  10. N. C. Bacalis, G. F. Anagnostopoulos, N. I. Papanicolaou, and D. A. Papaconstantopoulos, “Electronic structure of ordered and disordered Cu–Ag alloys,” Phys. Rev. B 55, 2144–2149 (1997). [CrossRef]
  11. J. T. Song, H. Y. Li, J. Li, S. Y. Wang, and S. M. Zhou, “Fabrication and optical properties of metastable Cu–Ag alloys,” Appl. Opt. 41, 5413–5416 (2002). [CrossRef]
  12. J. Rivory, “Comparative study of the electronic structure of noble-metal-noble-metal alloys by optical spectroscopy,” Phys. Rev. B 15, 3119–3135 (1977). [CrossRef]
  13. G. Yang, J. B. Sun, and J. Zhou, “Dielectric properties of aluminum silver alloy thin films in optical frequency range,” J. Appl. Phys. 109, 123105 (2011). [CrossRef]
  14. G. Yang, J. B. Sun, and J. Zhou, “Optical dielectric behaviors of copper zinc alloy thin films,” J. Appl. Phys. 111, 73103 (2012). [CrossRef]
  15. L. W. Barron, J. Neidrich, and S. K. Kurinec, “Optical, electrical, and structural properties of sputtered aluminum alloy thin films with copper, titanium and chromium additions,” Thin Solid Films 515, 3363–3372 (2007). [CrossRef]
  16. P. Durussel and P. Feschotte, “A revision of the binary system Ag–Pt,” J. Alloys Compd. 239, 226–230 (1996). [CrossRef]
  17. W. Chen, K. P. Chen, M. D. Thoreson, A. V. Kildishev, and V. M. Shalaev, “Ultrathin, ultrasmooth, and low-loss silver films via wetting and annealing,” Appl. Phys. Lett. 97, 211107 (2010). [CrossRef]
  18. P. Wissmann and H. Finzel, Electrical Resistivity of Thin Metal Films (Springer-Verlag, 2007).
  19. H. G. Tompkins and W. A. McGahan, Spectroscopic Ellipsometry and Reflectometry: A User’s Guide (Wiley Inter-Science, 1999).
  20. R. A. May, L. Kondrachova, B. P. Hahn, and K. J. Stevenson, “Optical constants of electrodeposited mixed molybdenum-tungsten oxide films determined by variable-angle spectroscopic ellipsometry,” J. Phys. Chem. C 111, 18251–18257 (2007). [CrossRef]
  21. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1977).
  22. H. G. Tompkins and E. A. Irene, Handbook of Ellipsometry(William Andrew, 2005).
  23. W. Theiss, “Optical properties of porous silicon,” Surf. Sci. Rep. 29, 91–192 (1997). [CrossRef]
  24. G. B. Irani, T. Huen, and F. Wooten, “Optical properties of Ag and alpha-phase Ag–Al alloys,” Phys. Rev. B 3, 2385–2390 (1971). [CrossRef]
  25. D. A. Bobb, G. Zhu, M. Mayy, A. V. Gavrilenko, P. Mead, V. I. Gavrilenko, and M. A. Noginov, “Engineering of low-loss metal for nanoplasmonic and metamaterials applications,” Appl. Phys. Lett. 95, 151102 (2009). [CrossRef]
  26. S. Auer, W. J. Wan, X. Huang, A. G. Ramirez, and H. Cao, “Morphology-induced plasmonic resonances in silver–aluminum alloy thin films,” Appl. Phys. Lett. 99, 041116 (2011). [CrossRef]
  27. S. K. O’Leary, “An analytical density of states and joint density of states analysis of amorphous semiconductors,” J. Appl. Phys. 96, 3680–3686 (2004). [CrossRef]
  28. W. B. Jackson, S. M. Kelso, C. C. Tsai, J. W. Allen, and S. J. Oh, “Energy dependence of the optical matrix element in hydrogenated amorphous and crystalline silicon,” Phys. Rev. B 31, 5187–5198 (1985). [CrossRef]
  29. L. R. RamMohan and P. A. Wolff, “Joint density of states in interband transitions in semiconductors in a magnetic field,” Phys. Rev. B 26, 6711–6718 (1982). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited