Abstract

We present a fully quantum scheme to perform two-dimensional atomic lithography based on a cross-cavity optical Stern–Gerlach setup: an array of two mutually orthogonal cavities crossed by an atomic beam perpendicular to their optical axes, which is made to interact with two identical modes. After deriving an analytical solution for the atomic momentum distribution, we introduce a protocol allowing us to control the atomic deflection by manipulating the amplitudes and phases of the cavity field states. Our quantum scheme provides subwavelength resolution in the nanometer scale for the microwave regime.

© 2014 Optical Society of America

Stern–Gerlach effect of multi-component ultraslow optical solitons via electromagnetically induced transparency

Zhiming Chen and Guoxiang Huang
J. Opt. Soc. Am. B 30(8) 2248-2256 (2013)

Entanglement detection via atomic deflection

C. E. Máximo, R. Bachelard, G. D. de Moraes Neto, and M. H. Y. Moussa
J. Opt. Soc. Am. B 34(12) 2452-2458 (2017)

All-optical Stern-Gerlach effect in the time domain

Gil Bashan, Avishay Eyal, Moshe Tur, and Ady Arie
Opt. Express 32(6) 9589-9601 (2024)

Two-channel cross-phase modulation in a multi-atom cavity quantum electrodynamics system

Guoqing Yang, Zheng Tan, and Yifu Zhu
J. Opt. Soc. Am. B 31(3) 619-625 (2014)

Quantum engineering and nonclassical properties of SU(1,1) and SU(2) entangled nonlinear coherent states

Amir Karimi and Mohammad Kazem Tavassoly
J. Opt. Soc. Am. B 31(10) 2345-2353 (2014)