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Journal of the Optical Society of Korea

Journal of the Optical Society of Korea


  • Vol. 14, Iss. 3 — Sep. 1, 2010
  • pp: 266–276

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

Dong-Hee Lee  »View Author Affiliations

Journal of the Optical Society of Korea, Vol. 14, Issue 3, pp. 266-276 (2010)

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In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 <TEX>${\mu}m$</TEX> resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 <TEX>${\mu}m$</TEX> line width.

© 2010 Optical Society of Korea

OCIS Codes
(080.1010) Geometric optics : Aberrations (global)
(080.3620) Geometric optics : Lens system design
(110.3960) Imaging systems : Microlithography
(220.0220) Optical design and fabrication : Optical design and fabrication

Original Manuscript: August 2, 2010
Revised Manuscript: August 26, 2010
Manuscript Accepted: August 27, 2010
Published: September 25, 2010

Dong-Hee Lee, "Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device," J. Opt. Soc. Korea 14, 266-276 (2010)

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